Abstract
We experimentally demonstrate the first integrated temporal Fourier transformer based on a linearly chirped Bragg grating waveguide written in silica glass with a femtosecond laser. The operation is based on mapping the energy spectrum of the input optical signal to the output temporal waveform by making use of first-order chromatic dispersion. The device operates in reflection, has a bandwidth of 10 nm, and can be used for incident temporal waveforms as long as 20 ps. Experimental results, obtained through both temporal oscilloscope traces and Fourier transform spectral interferometry, display a successful Fourier transformation of in-phase and out-of-phase pairs of input optical pulses, and demonstrate the correct functionality of the device for both amplitude and phase of the temporal output. (C) 2011 Optical Society of America

Abstract
We experimentally realized an integrated temporal Fourier transformer based on a linearly-chirped Bragg grating waveguide written in silica glass with a femtosecond laser. The device operates in reflection and has a 10-nm bandwidth. © 2011 OSA.

Abstract
An integrated optical refractometer based on multimode interference, with sensitivity enhancement due to sub-micrometer axial features, is demonstrated with experimental sensitivity as high as 3200 nm/RIU and resolution limits on the order of 5 ppm. © 2011 OSA.

Abstract
We report on the use of CHF3, C2F6, and SF6 as etch gases for deep reactive ion etch processing of germano-boro-silicate glass films prepared by flame hydrolysis deposition (FHD). The glass film under study had a composition of 83 wt % SiO2, 12 wt % GeO2, and 5 wt % B2O3. The scope of the study was to identify the benefits and drawbacks of each gas for fabrication of deep structures (>10 mu m) and to develop an etch process in each peas system. The etch rate, etch profile, and surface roughness of the FHD glass films were investigated for each gas. Etch rates and surface roughness were measured using a surface profiler and etch profiles were assessed using a scanning electron microscope. It was found that SF6 had the highest FHD glass etch rate and nichrome mask selectivity (>100:1) however, it had the lowest photoresist mask selectivity (<1:2) and highest lateral erosion. CHF3 had the lowest FHD glass etch rate but high selectivity over both nichrome (>80:1) and photoresist (>10:1) and the etch profile was found to be smooth and vertical. C2F6 had a similar etch profile to that of CHF3, but the selectivity over both mask materials was lower than in CHF3. Fused silica was used as a reference material where it was found the percentage drop in etch rate in C2F6, SF6, and CHF3 was -12%, -15%, and -37%, respectively. From the results presented here CHF3 proved to be the most versatile etch process as either photoresist or nichrome masks could be used to attain depths of 20 mu m, or more. (C) 1998 American Vacuum Society.

Abstract
Fluorescence lifetimes and scatter losses for Er3+ doped, silica waveguides formed by aerosol doping and flame hydrolysis deposition are reported. The fast decay component and out of plane scatter decreased markedly with optimisation of the deposition technique, sintering process and co-doping regime. (C) 1998 Elsevier Science B.V.

Abstract
We report the experimental observation of up-conversion in an integrated silica-on-silicon waveguide. Blue light at 455 nm and 475 nm was observed. In addition to the strong blue emission near infrared (similar to 800 nm), visible (648 nm) and UV (366 nm) lines were also detected. We investigated the excitation mechanisms by using different pumping wavelengths. (C) 1997 Elsevier Science B.V.